Patent · US Active

Evaporation system and fabricating method and evaporation method thereof

US9831430B2 · kind B2 · utility

0Cited by
0References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 14, 2016
Grant dateNov 28, 2017
Priority date
Expiry dateApr 14, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/164
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An evaporation source is provided. The evaporation source includes a substrate, a plurality of recesses spaced from each other and arranged on the substrate, and a plurality of heating sources arranged within the plurality of recesses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.