Patent · US Active

Device for carrying out a deposit of particles on a substrate and deposition method using such a device

US9839938B2 · kind B2 · utility

0Cited by

1References

19Claims

0Family size

Assignees

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR
C.N.R.S. · FR
Universite Joseph Fourier—Grenoble 1 · FR

Inventors

Emmanuel Picard · Grenoble, FR
Julien Cordeiro · Chalon-sur-Saône, FR
Kévin Berton · Grenoble, FR
David Peyrade · Moirans, FR
Marc Zelsmann · Meylan, FR

Key dates

Filing date	May 7, 2015
Grant date	Dec 12, 2017
Priority date	—
Expiry date	May 23, 2035

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31504
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Device (10) for depositing particles via the liquid route including a first chamber a second chamber (12), a communication hole between the first chamber (11) and the second chamber (12), and a vent which is provided in the second chamber and which places the second chamber and a medium (200) which is external with respect to the device in communication.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.