Patent · US Active

High-resolution patterning of graphene by screen and gravure printing for highly flexible printed electronics

US9840634B2 · kind B2 · utility

2Cited by

1References

15Claims

0Family size

Assignees

Northwestern University · US
Regents of the University of Minnesota · US

Inventors

Mark C. Hersam · Wilmette, US
Ethan B. Secor · Chicago, US
Sooman Lim · Gyeongsan-si, KR
C. Daniel Frisbie · Mahtomedi, US
Lorraine F. Francis · Minnetonka, US
Woo Jin Hyun · Seoul, KR

Key dates

Filing date	Apr 29, 2015
Grant date	Dec 12, 2017
Priority date	—
Expiry date	Apr 29, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/12
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Graphene ink compositions as can be utilized with gravure and screen printing processes, to provide flexible electronic components with high-resolution printed graphene circuitry.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.