Patent · US Active

Method for forming conductive mesh pattern, and mesh electrode and laminate manufactured thereby

US9841669B2 · kind B2 · utility

3Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 13, 2015
Grant dateDec 12, 2017
Priority date
Expiry dateMar 26, 2035

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2203/04112
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention relates to a method for manufacturing a conductive mesh pattern, a mesh electrode manufactured by the same, and a laminate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.