Exposure method, exposure device for performing the method and manufacturing method of display substrate using the method
US9841686B2 · kind B2 · utility
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2References
18Claims
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Key dates
| Filing date | Jun 16, 2015 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Nov 10, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method includes exposing a substrate to form a first pattern on a first layer, measuring a first alignment value of the first pattern, generating first correction data by using the first alignment value, storing the first correction data and exposing the substrate to form a second pattern on a second layer disposed on the first layer by using the first correction data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.