Method and system for imaging of a photomask through a pellicle
US9842724B2 · kind B2 · utility
0Cited by
14References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2016 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Feb 1, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.