Apparatus for generating extreme ultra-violet beam using multi-gas cell modules
US9844125B2 · kind B2 · utility
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Key dates
| Filing date | Dec 28, 2015 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Dec 28, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.