Patent · US Active

High throughput fabrication of nanoparticles

US9844509B2 · kind B2 · utility

0Cited by
8References
2Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 6, 2016
Grant dateDec 19, 2017
Priority date—
Expiry dateJun 6, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/906
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

This application provides a high throughput method of making nanoparticles that utilizes plates comprising wells (e.g., 96-well plates).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.