Method for pretreating substrates for PVD methods
US9845527B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2013 |
| Grant date | Dec 19, 2017 |
| Priority date | — |
| Expiry date | Feb 8, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32064
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.