Photoresist composition and method of manufacturing substrate for display device by using the same
US9851635B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Jul 16, 2015 |
| Grant date | Dec 26, 2017 |
| Priority date | — |
| Expiry date | Jul 16, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1,in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group; and R11 is selected from a C6-C15 aryl group, or a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.