Patent · US Active

Composition and method to form a self decontaminating surface

US9856360B2 · kind B2 · utility

5Cited by
8References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 4, 2015
Grant dateJan 2, 2018
Priority date
Expiry dateNov 4, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K2003/2241
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A polymeric material formed by reacting aminopolyol having a structure:wherein R4 is selected from the group consisting of —H and —CH2—CH2—OH; and an organosilane, wherein said organosilane has a structure:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.