(Meth)acrylate-based resin composition having excellent impact resistance and transparency
US9856373B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2014 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Oct 5, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L33/12
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed is a (meth)acrylate-based resin composition comprising a poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer comprising phenyl(meth)acrylate having excellent surface hardness and a high refractive index, as a base resin and a (conjugated diene (meth)acrylate) graft copolymer having excellent impact absorption efficiency, the (meth)acrylate-based resin composition providing excellent transparency by exhibiting excellent impact resistance even using a small amount of impact modifier. The (meth)acrylate-based resin composition having excellent impact resistance and transparency comprises 1 to 29 wt % of the (conjugated diene-(meth)acrylate) graft copolymer and 71 to 99 wt % of the poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.