Fabrication method for micromechanical sensors
US9857229B1 · kind B1 · utility
6Cited by
16References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 21, 2016 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Jun 21, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0132
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of fabricating electromagnetic radiation detection devices including: forming a first mask on a substrate; forming a structural layer on the substrate using the first mask; forming a metallic layer overlying the structural layer; removing the first mask; forming a second mask on the substrate, the second mask comprising mask openings; selectively patterning the metallic layer using the mask openings; and removing the second mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.