Device to adjust gas concentration in fluids
US9857342B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 5, 2015 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Aug 22, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device to adjust concentration of a first gas in a fluid to a target concentration (Cf) is provided. The device includes a container, having a first opening, the container is configured to receive a first volume (VL) of the fluid through the first opening. Wherein the fluid has an initial concentration (Ci) of the first gas and a second volume (VC) of the container is determined based on the initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL), and configured to adjust pressure in the container at a predetermined pressure of the first gas to adjust the first gas concentration in the fluid to the target concentration (Cf); wherein the second volume (VC) and the first volume (VL) are correlated by:in that M is an amount of the first gas required to be introduced in the container to adjust the first gas concentration in the fluid to the target concentration (Cf).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.