Positive photosensitive siloxane resin composition and display device formed using the same
US9857682B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2015 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Mar 11, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent,(R1)nSi(R2)4-n [Chemical Formula 1]Si(R3)4 [Chemical Formula 2]wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, R3s may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.