Extreme ultraviolet generation device and exposure system including the same
US9857690B2 · kind B2 · utility
5Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2016 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Jun 15, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.