Patent · US Active

Method of producing a Fresnel Zone Plate for applications in high energy radiation

US9859028B2 · kind B2 · utility

0Cited by
51References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 7, 2013
Grant dateJan 2, 2018
Priority date
Expiry dateJan 28, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49982
  • WIPO fieldEngines, pumps, turbines
  • WIPO sectorMechanical engineering

Abstract

The invention concerns to a method of producing a Fresnel Zone Plate (1) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.