X-ray laser microscopy sample analysis system and method
US9859029B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Feb 26, 2017 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Feb 26, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/316
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. At least one sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, often using a sample administration device configured to present a plurality of samples. The sample is exposed to brief bursts of coherent X-ray illumination, often further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from the samples is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same samples can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the samples.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.