Film system
US9861974B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2016 |
| Grant date | Jan 9, 2018 |
| Priority date | — |
| Expiry date | Aug 24, 2036 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF01N3/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A film system includes a substrate and a film disposed on the substrate. The film includes a monolayer formed from a fluorocarbon and a plurality of regions disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon. Each of the plurality of regions includes a photocatalytic material. A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.