Method for manufacturing holographic blazed grating
US9864113B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2012 |
| Grant date | Jan 9, 2018 |
| Priority date | — |
| Expiry date | Dec 29, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2260/14
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating a holographic blazed grating is provided. The method includes: coating a photoresist layer on a substrate; performing lithography on the photoresist layer to form a photoresist grating; performing vertical ion beam etching on the substrate by using the photoresist grating as a mask, to form a homogeneous grating by transferring a pattern of the photoresist grating onto the substrate; cleaning the substrate to remove remaining photoresist; performing tilted Ar ion beam scanning etching on the substrate by using the homogeneous grating as a mask, and etching different portions of the substrate by utilizing a obscuring effect of the homogeneous grating mask on the ion beam, to form a triangular groove shape of the blazed grating; and cleaning the substrate to obtain the holographic blazed grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.