Patent · US Active

Excimer light source

US9865448B2 · kind B2 · utility

0Cited by
2References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 30, 2015
Grant dateJan 9, 2018
Priority date
Expiry dateJan 30, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC02F2201/3227
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.