Displacement measuring system and machining system comprising the same
US9869540B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 2016 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Nov 23, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A displacement measuring device includes an optical module for refracting or reflecting light; a beam splitting module including a polarizing beam splitting layer for allowing light with a first polarization direction to pass through and reflecting light with a second polarization direction; a light source for generating a first light beam with the first polarization direction and a second light beam with the second polarization direction, wherein the first light beam is reflected by a measured object after passing through the optical module and the beam splitting module, and the second light beam is reflected by the polarizing beam splitting layer after passing through the optical module; an image sensor for sensing an interference pattern generated by the reflected first and second light beams; and a processing unit for calculating a displacement value of the measured object according to the interference pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.