Patent · US Active

Method and device for examining a mask

US9869640B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Thomas Trautzsch · Oil City, US
Ute Buttgereit · Jena, DE
Thomas Thaler · Jena, DE

Key dates

Filing date	Dec 8, 2014
Grant date	Jan 16, 2018
Priority date	—
Expiry date	Jul 15, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/95676
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for examining a mask includes providing a position data set having error positions of the mask to be examined, providing a structure data set having the structure of the mask, and specifying structural features of the mask, the values of which are to be determined. At each error position, determining the values of the specified structural features of the structure by using a computing unit, determining a measuring task from specified decision criteria and from the determined values of the structural features of the structure by using the computing unit, and carrying out the determined measuring task in a manner controlled by the computing unit. In addition, a device, in particular a microscope, for carrying out the method is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.