Patent · US Active

Dental materials based on low-odour thiols

US9877898B2 · kind B2 · utility

4Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 24, 2015
Grant dateJan 30, 2018
Priority date
Expiry dateFeb 24, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G75/045
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

Dental material, which contains an ene compound with two or more C—C multiple bonds and a thiol according to general Formula (1) or an oligomer based on such a thiol,wherein n, p and m are chosen such that the thiol has a total of at least 3 SH groups.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.