Dental materials based on low-odour thiols
US9877898B2 · kind B2 · utility
4Cited by
4References
19Claims
0Family size
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Key dates
| Filing date | Feb 24, 2015 |
| Grant date | Jan 30, 2018 |
| Priority date | — |
| Expiry date | Feb 24, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G75/045
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Dental material, which contains an ene compound with two or more C—C multiple bonds and a thiol according to general Formula (1) or an oligomer based on such a thiol,wherein n, p and m are chosen such that the thiol has a total of at least 3 SH groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.