Liquid cleaning compositions with lower freezing point
US9879204B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2011 |
| Grant date | Jan 30, 2018 |
| Priority date | — |
| Expiry date | Jun 23, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D3/30
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning composition according to one embodiment includes a surfactant system comprising a nonionic surfactant in combination with an anionic surfactant; and an amine neutralized organic acid (ANOA). A concentrated composition according to yet another embodiment includes an amine neutralized organic acid (ANOA) present in an effective amount to lower a freezing point of the concentrated composition, wherein the ANOA is present at no more than about 5 wt % based on a total weight of the concentrated composition. A concentrated cleaning composition in yet another embodiment includes a surfactant system having an invert structure, the surfactant system comprising a nonionic surfactant in combination with an anionic surfactant; an organic acid present in a concentration of greater than 0 to about 5 wt % based on a total weight of the cleaning composition; and an alkaline component. Methods of making are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.