Method for manufacturing master mold, master mold manufactured thereby, method for manufacturing transparent photomask, transparent photomask manufactured thereby, and method for forming conductive mesh pattern using transparent photomask
US9880461B2 · kind B2 · utility
1Cited by
1References
20Claims
0Family size
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Key dates
| Filing date | Feb 13, 2015 |
| Grant date | Jan 30, 2018 |
| Priority date | — |
| Expiry date | Mar 20, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04112
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a method for manufacturing a master mold, a master mold manufactured by the method, a method for manufacturing a transparent photomask, a transparent photomask manufactured by the method, and a method for manufacturing a conductive mesh pattern by using the transparent photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.