Patent · US Active

Rendering multi-part glyphs

US9881395B2 · kind B2 · utility

1Cited by

8References

15Claims

0Family size

Assignee

SAP SE · DE

Inventors

Shihui Wang · Wiesloch, DE
Jasmin Bajric · Schallstadt, DE

Key dates

Filing date	Aug 21, 2015
Grant date	Jan 30, 2018
Priority date	—
Expiry date	Aug 21, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG06F40/109
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

Disclosed herein are technologies for facilitating rendering of glyphs. In accordance with one aspect, a vector-based glyph is decomposed into multiple part-glyphs. A font file including rendering data of the part-glyphs is generated. The part-glyphs are individually configured with respective properties. A mapping file that includes configuration information of the part-glyphs may also be generated. The configuration information may include grouping information and the respective properties of the part-glyphs.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.