Substrate for display device and method for manufacturing display device
US9881938B2 · kind B2 · utility
1Cited by
0References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 16, 2015 |
| Grant date | Jan 30, 2018 |
| Priority date | — |
| Expiry date | May 17, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/674
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
According to one embodiment, a substrate for display device includes an insulating substrate and a conductive film formed on at least one main surface of the insulating substrate. As to the substrate in an etching process in which a fluoric acid solution containing 10% or more hydrogen fluoride is used, a first etching rate of the conductive film is substantially the same as a second etching rate of the insulating substrate, or the first etching rate is greater than the second etching rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.