Method for eliminating mask self-magnetization, substrate manufacturing method and mask testing device
US9885104B2 · kind B2 · utility
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1References
13Claims
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Key dates
| Filing date | Jun 19, 2015 |
| Grant date | Feb 6, 2018 |
| Priority date | — |
| Expiry date | Feb 19, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are a method for eliminating self-magnetization of a mask, a method for manufacturing a substrate and a mask testing device. The mask may include a plurality of metal stripes spaced from each other. The method may include a step of: energizing the mask, so as to enable the plurality of metal stripes to carry like charges, thereby separating every metal stripe from other adjacent metal stripes bonded together.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.