Patent · US Active

Method of manufacturing solar cell

US9887314B2 · kind B2 · utility

0Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 2016
Grant dateFeb 6, 2018
Priority date
Expiry dateJun 9, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/547
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a method of manufacturing a solar cell. The method includes forming a protective film using an insulation film over a semiconductor substrate, the semiconductor substrate including a base area of a first conductive type and formed of crystalline silicon. The forming of the protective film includes a heat treatment process performed at a heat treatment temperature of 600 degrees Celsius or more under a gas atmosphere including a halogen gas, which has a halogen element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.