Patent · US Active

Process for application of metal

US9889471B2 · kind B2 · utility

0Cited by
1References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2014
Grant dateFeb 13, 2018
Priority date
Expiry dateApr 29, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24355
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process for application of metal on a substrate surface comprises applying a mixture of a solvent, a polymerizable monomer, and a photoinitiator on a substrate surface, wherein the photoinitiator does not form two phases together with the monomer and the solvent, i.e. it forms an amorphous mixture without any crystals. The monomer is able to polymerize to a polymer comprising at least one carboxylic group. Thereafter the solvent is evaporated. Polymerization is induced by irradiating the applied dried mixture. Ions are applied and reduced to metal and thereafter further metal can be deposited. The method can be used in industrial processes, both 2D and 3D surfaces can be coated with metal. Materials sensitive to standard grafting chemicals and/or polymers containing halogen atoms can be coated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.