Method for structuring layer surfaces
US9890450B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2013 |
| Grant date | Feb 13, 2018 |
| Priority date | — |
| Expiry date | May 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32614
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A coating method based on gas phase deposition by arc evaporation, with the steps: selecting a first target as a material source for the coating; providing a coating chamber with an arc evaporation source including the selected target; loading the chamber with substrates to be coated; pumping down the chamber to a process pressure suitable for the arc evaporation; and igniting and operating the arc such that material is evaporated from the first target and is then deposited on the substrates to be coated, optionally after reaction with a reactive gas admitted into the coating chamber. The first target includes at least one matrix component and one doping component such that the doping component has a melting point at least 500° C. lower than the matrix component, and a melted drop of the doping component on a solid surface of the matrix component assumes a contact angle of a least 90°.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.