Chemical coating of microwell for electrochemical detection device
US9891190B2 · kind B2 · utility
1Cited by
39References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2016 |
| Grant date | Feb 13, 2018 |
| Priority date | — |
| Expiry date | Jun 27, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/143333
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The described embodiments may provide a method of fabricating a chemical detection device. The method may comprise forming a microwell above a CMOS device. The microwell may comprise a bottom surface and sidewalls. The method may further comprise applying a first chemical to be selectively attached to the bottom surface of the microwell, forming a metal oxide layer on the sidewalls of the microwell, and applying a second chemical to be selectively attached to the sidewalls of the microwell. The second chemical may lack an affinity to the first chemical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.