Patent · US Active

Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning

US9891520B2 · kind B2 · utility

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18Claims

0Family size

Assignee

BASF SE

Inventors

Andreas Klipp · Lambsheim, DE
Andrei Honciuc · Iași, RO
Chu-Ya Yang · Pingzhen District, TW

Key dates

Filing date	Jul 8, 2014
Grant date	Feb 13, 2018
Priority date	—
Expiry date	Sep 20, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/22
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.