Method of manufacturing solid-state image sensor, solid-state image sensor, and camera
US9893110B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 23, 2016 |
| Grant date | Feb 13, 2018 |
| Priority date | — |
| Expiry date | Jul 12, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/811
Abstract
A method of manufacturing a solid-state image sensor is provided. The method comprises preparing a structure which is covered by a protective film, depositing a first material by using a first color filter material on the protective film, forming a first color filter from the first material, depositing a second material by using a second color filter material after the forming the first color filter and forming a second color filter from the second material. An upper surface of the protective film has a concave portion. A part of the first material enters the concave portion in the depositing the first material, the first material is patterned so as to form a member in the concave portion from the first material in the forming the first color filter and the second material covers the member in the depositing the second material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.