Method for fabricating COA array substrate, array substrate and display device
US9893129B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2013 |
| Grant date | Feb 13, 2018 |
| Priority date | — |
| Expiry date | Nov 2, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for fabricating a COA array substrate, an array substrate and a display device are provided. The fabrication method comprises the following steps: forming a protection layer (12) on the TFT substrate (11); coating a photoresist layer (21) on the protection layer (12), the photoresist layer (12) functioning as a planarized layer (14), wherein the TFT substrate (11) comprises a substrate (111) and a TFT (112); forming a color filter receiving hole (32) in the photoresist layer (21) through a photolithography process; fabricating the color filter layer (31) in the color filter receiving hole (32). The above fabrication method can reduce the complexity and cost of conventional method for fabricating the array substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.