Patent · US Active

Method for manufacturing a solar cell with a surface-passivating dielectric double layer, and corresponding solar cell

US9893215B2 · kind B2 · utility

0Cited by

3References

16Claims

0Family size

Assignees

HANWHA Q CELLS GMBH · DE
SOLARWORLD INDUSTRIES GMBH · DE

Inventors

Jan Philipp SCHMIDT · Munich, DE
Bram Hoex · Singapore, SG

Key dates

Filing date	Nov 6, 2008
Grant date	Feb 13, 2018
Priority date	—
Expiry date	Aug 10, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E10/547
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A solar cell with a dielectric double layer and also a method for the manufacture thereof are described. A first dielectric layer (3), which contains aluminum oxide or consists of aluminum oxide, and a second, hydrogen-containing dielectric layer (5) are produced by means of atomic layer deposition, allowing very good passivation of the surface of solar cells to be achieved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.