Particle reactor for atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes
US9896763B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 13, 2016 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | May 13, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A powder coating apparatus reactor includes a loading port for a powder material, an inlet for one or more coating precursors, and a reaction chamber having an inner surface and a plurality of axial baffles. Each axial baffle extends inwardly from the inner surface of the reaction chamber of the rotary vessel. The plurality of axial baffles is configured to keep the powder material flowing within the reaction chamber during rotation of the rotary vessel to facilitate contact between the powder material and the one or more coating precursors. The powder coating apparatus further includes a rotary vacuum seal located at the loading port. The powder coating apparatus also includes a motor capable of actuating the rotary vessel about a center axis for rotation during reaction of the powder material with the coating precursors in the reaction chamber. Methods for coating powder materials with such a reactor are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.