Apparatus and method for measuring deposition rate
US9897539B2 · kind B2 · utility
0Cited by
8References
19Claims
0Family size
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Key dates
| Filing date | Sep 22, 2015 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Sep 22, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring a deposition rate includes a light source unit in a deposition region between a deposition source and a substrate in a vacuum chamber, the light source unit emits a monochromatic light toward a deposition material released from the deposition source, a photosensor unit that measures at least one of light absorption, scattering, and emission in the deposition region when light emitted from the light source unit passes through the deposition region, and a multi-pass forming unit defining a multi-pass path between the light source unit and the photosensor unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.