Metallic nanomesh
US9899117B2 · kind B2 · utility
1Cited by
1References
12Claims
0Family size
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Key dates
| Filing date | Jun 6, 2014 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Jun 6, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24331
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 300Ω/□ when stretched to a strain of 200% in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.