Gas intake device of magnetron sputtering vacuum chamber and magnetron sputtering apparatus
US9899192B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 23, 2015 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Oct 17, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas intake device of magnetron sputtering vacuum chamber and a magnetron sputtering apparatus with the gas intake device, the gas intake device of magnetron sputtering vacuum chamber comprises a gas mixing box configured to receive and mix the gas, a gas intake box configured to introduce the gas into a vacuum chamber, and a connecting pipe configured to connect with the two boxes, the gas mixing box has one or more gas intake pipes. The gas intake device can increase the distribution uniformity after the gas enters inside the vacuum chamber, effectively decrease the impact force to the precision equipment(s) in the vacuum chamber, and extend the service life of the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.