System and method for inhibiting VUV radiative emission of a laser-sustained plasma source
US9899205B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2016 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Jul 29, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.