Methods for depositing a monolayer on a substrate
US9899212B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | Apr 15, 2016 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Apr 15, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31058
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods and compositions for depositing a monolayer onto a surface of a substrate are described. The method can include contacting the surface with a vapor phase comprising a carbene source, and reacting a carbene group from the carbene source with a functional group on the surface, to obtain a covalently bound monolayer on the surface of the substrate. The carbene source can be a diazirine compound. The functional group on the surface can be a C—H containing group, a Si—H containing group, among others, or combinations thereof. The method can further involve removing physisorbed molecules from the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.