Patent · US Active

Photosensitive adhesive

US9902881B1 · kind B1 · utility

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0References
2Claims
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Assignee

Inventors

Key dates

Filing dateNov 29, 2016
Grant dateFeb 27, 2018
Priority date
Expiry dateNov 29, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L2312/06
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A photosensitive adhesive is polymerized by a cinnamate monomer and a monomer A. By irradiating under different light waves, triggering reversible cyclization causes the adhesion force of the adhesive to change. The adhesion force change is repeatable. Therefore, the efficiency of the manufacture process would increase, and the cost of material would be reduced.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.