Oxide sintered body and sputtering target
US9905403B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2013 |
| Grant date | Feb 27, 2018 |
| Priority date | — |
| Expiry date | Oct 15, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02631
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An oxide sintered body is obtained by mixing and sintering a zinc oxide, an indium oxide, a gallium oxide and a tin oxide. The oxide sintered body has a relative density of 85% or more, and has volume ratios satisfying the following expressions (1) to (3), respectively, as determined by X•ray diffractometry: (1) (Zn2SnO4 phase+InGaZnO4 phase)/(Zn2SnO4 phase+InGaZnO4 phase+In2O3 phase+SnO2 phase+(ZnO)mIn2O3, phase)≧75% by volume; (2) Zn2SnO4 phase/(Zn2SnO4 phase+InGaZnO4 phase+In2O3 phase+SnO2 phase+(ZnO)mIn2O3 phase)≧30% by volume; and (3) InGaZnO4 phase/(Zn2SnO4 phase+InGaZnO4 phase+In2O3 phase+SnO2 phase+(ZnO)mIn2O3 phase)≧10% by volume, and m represents an integer of 2 to 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.