Reactions of aromatic substrates with base-activated hydrosilanes-silylations and reductive cleavage
US9908840B2 · kind B2 · utility
7Cited by
3References
48Claims
0Family size
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Key dates
| Filing date | Oct 2, 2013 |
| Grant date | Mar 6, 2018 |
| Priority date | — |
| Expiry date | Mar 26, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07B2200/05
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention describes chemical systems and methods for reducing C—O, C—N, and C—S bonds, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said system optionally comprising at least one molecular hydrogen donor compound, molecular hydrogen, or both.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.