Thickness determination and layer characterization using terahertz scanning reflectometry
US9909986B2 · kind B2 · utility
3Cited by
23References
8Claims
0Family size
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Key dates
| Filing date | Jul 9, 2015 |
| Grant date | Mar 6, 2018 |
| Priority date | — |
| Expiry date | Jul 9, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/13
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A terahertz scanning reflectometer system is described herein for in-situ measurement of polymer coating thickness, semiconductor wafer's surface sub-surface inspection in a non-destructive and non-invasive fashion with very high resolution (e.g., 25 nm or lower) and spectral profiling and imaging of surface and sub-surface of biological tissues (e.g., skin) in a non-invasive fashion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.