Vapor-liquid contacting apparatuses and methods for removing contaminants from gas streams
US9914090B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2013 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Feb 25, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J19/245
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Vapor-liquid contacting apparatuses and methods for removing contaminants from gas streams are provided. In an embodiment, a vapor-liquid contacting apparatus includes a vortex contacting stage having a contacting zone bound by a wall and defining an axis, a radially inner region surrounding the axis, and a radially outer region adjacent the wall. The vapor-liquid contacting apparatus also includes a feed conduit configured to direct flow of a feed gas into the radially outer region of the contacting zone in a direction tangential to the axis to form a vortex. Further, the vapor-liquid contacting apparatus includes a liquid conduit configured to deliver a liquid absorbent stream to the radially inner region in the contacting zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.