Patent · US Active

Method for supplying a process with an enriched carrier gas

US9914997B2 · kind B2 · utility

0Cited by

7References

15Claims

0Family size

Assignee

OSRAM Opto Semiconductors GmbH · DE

Inventors

Andreas Koller · Regensburg, DE
Alexander Behres · Pfatter, DE

Key dates

Filing date	Mar 28, 2014
Grant date	Mar 13, 2018
Priority date	—
Expiry date	Oct 10, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/52
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method for supplying a process with an enriched carrier gas. A first apparatus and a second apparatus are provided. The first apparatus has a precursor and is configured to bring a carrier gas into contact with the precursor and to enrich the carrier gas with the precursor. The second apparatus has a precursor and is configured to bring a carrier gas into contact with the precursor and to enrich the carrier gas with the precursor. The first apparatus supplies the second apparatus with an enriched carrier gas. The second apparatus supplies the enriched carrier gas for the process. A temperature of the first apparatus is controlled as a function of a quantity of precursor in the second apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.