Optical waveguide structure with waveguide coupler to facilitate off-chip coupling
US9915784B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2015 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Aug 6, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/2821
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Aspects of the invention are directed to a method for forming an optical waveguide structure. Initially, a base film stack is received with an optical waveguide feature covered by a lower dielectric layer. An etch stop feature is then formed on the lower dielectric layer, and an upper dielectric layer is formed over the etch stop feature. Subsequently, a trench is patterned in the upper dielectric layer and the etch stop feature at least in part by utilizing the etch stop feature as an etch stop. Lastly, a waveguide coupler feature is formed in the trench, at least a portion of the waveguide coupler feature having a refractive index higher than the lower dielectric layer and the upper dielectric layer. The waveguide coupler feature is positioned over at least a portion of the optical waveguide feature but is separated from the optical waveguide feature by a portion of the lower dielectric layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.